- Dutch government’s updated export license requirement statement
September 06 2024 07:20:38 UTC– ASML Friday confirmed a change to export Licensens required by the Dutch government concerning advanced immersion lithography technology needed to create fast microchips.
Immersion Lithography Systems
As a result, ASML will need to apply for export licenses with the Dutch government rather than the US government for shipments of its TWINSCAN NXT:1970i and 1980i DUV immersion lithography systems. ASML believes this requirement will harmonize the approach for issuing export licenses, the company said in a statement.
Essential for Integrated Circuits
The TWINSCAN NXT:1970i and 1980i are advanced deep ultraviolet (DUV) immersion lithography systems used in semiconductor manufacturing. These systems are designed for high-precision patterning on silicon wafers, which is crucial for creating microchips. They offer high throughput and accuracy, making them essential for producing the latest generation of integrated circuits.
Export Bans and Checks
Export controls are necessary for advanced lithography systems like the TWINSCAN NXT:1970i and 1980i because they are critical to semiconductor manufacturing, which is a strategic technology.
These systems are used to create the tiny, precise patterns on silicon wafers that are essential for producing advanced microchips. Since microchips are vital for a wide range of technologies, including military, aerospace, and national security applications, controlling their export helps prevent these high-tech capabilities from falling into the hands of potential adversaries or being used in ways that could threaten global security.
Export controls help manage the spread of this sensitive technology to ensure it is not used to produce advanced weaponry or other strategic technologies in countries of concern.